Process Analysis & Technology

The Nanoscribe Photonic Professional GT2 is the world's highest resolution 3D printer for nano and micro fabrication. It therefore meets the highest requirements for printing the smallest 3D precision parts with excellent shape accuracy.

The process consists of the combination of micro and nano 3D printing with two lithographic impression methods.

In the first step, 3D printing is used to structure and shape the surfaces. Due to the additive manufacturing technology, practically all surface structures can be realized. Only overhanging structural elements have to be avoided due to the subsequent molding steps. The subsequent moulding of the 3D-print structures results in a structured tool insert which can be used in a subsequent step in micro injection moulding to structure the surface of thermoplastic polymers.

Due to the reusability of the tool insert in injection moulding, the structure can be transferred to a variety of components within a short time. Thus, quantities that would not be possible with the original 3D printing can be achieved within a very short time.

Absorption spectra of solids and liquids can be measured with the desktop spectrograph Lambda 1050 from Perkin Elmer. Extinctions up to 4 in a wavelength range from UV up to long wave NIR can be detected. A integrating sphere can be integrated in the spectrometer to measure specular and diffuse reflectance as well as transmission.

IR spectra are being measured with an Perkin Elmer System 2000 FTIR spectrometer. The sample can be measured in transmission, diffuse reflectance or in ATR mode.

The fluorescence spectrometer Fluorolog 3 from Horiba enables fluorescence measurements in a wavelength range from 200 to 700 nm. The emission spectra can be recorded from 300 to 1000 nm with a signal-to-noise ratio of 4000:1. This system enables the measurement of 3D spectra by successive scanning through the excitation wavelengths.

The RXN1 Raman system from Kaiser Optical Instruments can be used for inline measurements for analysis and monitoring of chemical processes. In addition, solids, powders, gels and liquids can be measured online with various probes.

The microscopic methods range from dark field / bright field microscopy through polarisation- and inverse micros­copy to techniques like differential interference con­trast (DIC) or circular polarisation (CP).

The inte­gra­ted soft­ware quantifies the morphological struc­tures. Thus the computer calculates, for example, distri­bu­tions or fine­ness of fibre bundles or areas of corrosion.

Atomic Force Microscopy (AFM)
Scanning Nearfield optical Microscopy (SNOM)
Scanning Nearfield Optical Spectroscopy (SNOS)

SNOM and SNOS with Aperture-based and Aperture-less Probes

Our unique, multimodal microscopy system allows AFM, SNOM and SNOS in various modi and combinations:

• Use of apertureless probes (SIL) or aperture-based probes (pinhole pyramids)
• Measurement in reflexion or in transmission

SNOS: VIS-, NIR-, Raman-, Back Scattering- and Fluorescence Spectroscopy

The combination of AFM, near field (SNOM, SNOS) and far field techniques (e.g. Raman Imaging, confocal Microscopy) on the same instrument allows us to analyze the same sample position with various measuring setups.

Chemical Imaging (CI) combines different technologies like optical microscopy, digital imaging and molecular spectroscopy in combination with multivariate data analysis methods.

After the collection of the spectroscopic data, different strategies are applied to extract the most important and fundamental information from a large set of data.Experimental design is used to select or design the sample and data set. The recorded data are illustrated, evaluated, summarised and reviewed carefully. Based on a recog­nised pattern, a calibration model is calculated and tested, i. e. applied to another set of samples. If this test gives reasonable results, the model is verified and, finally, will be generalised to meet the requirements in the “real world” at the production line.

Additionally, this fundamental model serves as guide­line for the design and construction of a monitoring system for on-line or in situ process control.

Process Analysis Tools

• Correlation and regression methods
• Unscrambler, Design Expert, SPSS, SIMCA
• Time series, data visualisation
• MatLab Toolbox, PLS - Toolbox

Analysis, Modelling and Simulation (Selection)

• Principal Component Analysis (PCA)
• Partial Least Square Regression (PLS)
• Multivariate Curve Resolution (MCR)
• Neuronal Networks (Kohonen, RBF)
• Clustering (hierarchical, K-mean)

Evolving Factor Analysis (EFA) and Multivariate Curve Resolution (MCR)

EFA and MCR are procedures that calculate the number of relevant chemical compounds and their concentration, respectively, directly from the reaction spectra.

Analysis, modeling and simulation (selection)

• Principal Component Analysis (PCA)
• Partial Least Square Regression (PLS)
• Multivariate Curve Resolution (MCR)
• Neuronal Networks (Kohonen, RBF)
• Clustering (hierarchical, K-mean)

Evolving Factor Analysis (EFA) and Multivariate Curve Resolution (MCR)

EFA and MCR are methods that calculate the number of relevant chemical compounds or their concentration directly from the reaction spectra.

The tabletop SEM EM-30N from Coxem is a table-top device with high resolution (up to 5 nm optical), equipped with an SE and BSE detector.

This enables material characterization both in terms of surface topography/morphology and material contrast.

The samples can be sputtered with different targets (e.g. Au, Pt).